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Formation behavior of SiP precipitates in CZ-Si crystals with heavily doped phosphorus
Formation behavior of SiP precipitates in CZ-Si crystals with heavily doped phosphorus
2020
Takeshi Senda
Shingo Narimatsu
Yoshiaki Abe
Susumu Maeda
Hisashi Matsumura
Takashi Isikawa
Kozo Nakamura
Keywords:
Materials science
Doping
Silicon
Chemical engineering
Phosphorus
Semiconductor
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