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Acemap > Paper > Low Resistive Contacts of TiN-Barrier and Ru-Electrode Using PCM Sputtering for MIM-Ta2O5 Capacitors in Giga-Bit DRAMs

Low Resistive Contacts of TiN-Barrier and Ru-Electrode Using PCM Sputtering for MIM-Ta2O5 Capacitors in Giga-Bit DRAMs

2003 
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