Dissociative electron attachment and dissociative ionization of 1,1-dichloro-1-silacyclohexane and silacyclohexane

Abstract Here we present a study on dissociative electron attachment (DEA) and dissociative ionization (DI) of 1,1-dichloro-1-silacyclohexane and silacyclohexane, and we discuss the results in relation to the role of secondary electrons in focused electron beam induced deposition (FEBID). In both 1,1-dichloro-1-silacyclohexane and silacyclohexane DI leads to extensive fragmentation that is governed by carbon and hydrogen loss. In 1,1-dichloro-1-silacyclohexane DEA also leads to a wide-range of fragments, but with the exception of the Cl − formation and the formation of C 5 H 6 Si − , most channels appear with low efficiency. Different from 1,1-dichloro-1-silacyclohexane, no fragment formation is observed in DEA to silacyclohexane. This compound might thus be suitable to distinguish between DEA and DI through secondary electrons in FEBID.