Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)

Eugene Braginets,V. Kurashov,S. Honcharuk,Vladimir I. Girnyk,Sergey A. Kostyukevych,K. V. Kostyukevych

Microlithography application for production of multilevel diffractive optical elements (as a security hologram feature)

2011

Eugene Braginets
V. Kurashov
S. Honcharuk
Vladimir I. Girnyk
Sergey A. Kostyukevych
K. V. Kostyukevych

The goal of a present research is to develop a method for production of multilevel Diffractive Optical Elements (DOEs) for use in Digital Security Holograms, using the direct-writing maskless lithography system.

Keywords:

X-ray lithography
Electron-beam lithography
Photolithography
Holography
Maskless lithography
Next-generation lithography
Materials science
Optoelectronics
Optics

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