Liquid-jet laser-plasma X-ray sources for microscopy and lithography

We review the development of compact laser-plasma soft x-ray sources based on microscopic liquid-drop or liquid-jet targets. It is shown that such sources provide practically debris-free, high-flux operation at water-window and EUV wavelengths. This regenerative and solid-density target system holds promise for the generation of high-average power using high-repetition-rate lasers. Application of the source to compact x-ray microscopy, multi layer-op tics characterization and EUV lithography is briefly discussed.