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Plasma assisted CVD method of TEOS basis for the preparation of silicas.
Plasma assisted CVD method of TEOS basis for the preparation of silicas.
1987
David Nin-Kou Wang
John M. White
Kam S. Law
Cissy Leung
Salvador P. Umotoy
Kenneth S. Collins
John A. Adamik
Ilya Perlov
Dan Maydan
Keywords:
Plasma
Inorganic chemistry
Materials science
Chemical engineering
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