Monolithic Electrochromic Devices: Tantalum Oxide Thin Film Ionic Conductors

Publisher Summary This chapter presents results for thin films of tantalum oxide (Ta2O5) prepared by reactive magnetron sputtering that form a part of an ongoing program to develop monolithic electrochromic devices. The dependence of the electrochromic response and related charge loss processes have been studied for Ta2O5 films of different thicknesses prepared on a-WO3 electrochromic films. In addition, indium tin oxide films suitable for use as the top layer transparent conducting oxide have been successfully prepared by “cold” sputtering. It also focuses on the influence of Ta2O5 coatings on the electrochromic response of amorphous tungsten oxide, the ionic conductivity of Ta2O5 and the mechanism of charging, and associated charge losses during the monolithic device fabrication.