Fabrication of Micro-Grooves in Silicon Carbide Using Femtosecond Laser Irradiation and Acid Etching

A simple method using an 800-nm femtosecond laser and chemical selective etching is developed for fabrication of high-aspect-ratio grooves in silicon carbide. Micro grooves with an aspect ratio of approximately 40 are obtained. The morphology and chemical compositions of the grooves are analyzed using a scanning electronic microscope equipped with an energy dispersive x-ray spectroscopy. The formation mechanism of SiC grooves is attributed to the chemical reactions of the laser induced structural changes with a mixed solution of hydrofluoric acid and nitric acid. In addition, the effects of laser irradiation parameters on the aspect ratio of the grooves are investigated.