Pulsed laser deposition of x-ray optical layer stacks with atomically flat interfaces

Pulsed laser deposition is described as a technique for the synthesis of multilayers showing X- ray optical quality. The state of the art is characterized by results that demonstrate a development of the instrument basis superior to that of conventional PLD systems. Multilayers of the Ni/C, Mo/Si- and W/C-types prove the versatility of the method and the output of layer stack characterization by HREM, SPM, XD, AES, XPS, ellipsometry and image processing ensures a high quality with regard to stack regularity, layer homogeneity and interface smoothness.