Hard TiN Coating by Magnetron-ICP PI³D

A 30-kV plasma immersion ion implantation setup (P ) has been equipped with a self-developed 6'-magnetron to perform hard coatings with enhanced adhesion by P D(P assisted deposition) process. Using ICP source with immersed Ti antenna and reactive magnetron sputtering of Ti target in /Ar ambient gas mixture, the TiN films were prepared on Si substrates at different pulse bias and ion-to-atom arrival ratio ( ). Prior to TiN film formation the nitrogen implantation was performed followed by deposition of Ti buffer layer under A irradiation. Films grown at =0.003 and =-20kV showed columnar grain morphology and (200) preferred orientation while those prepared at =0.08 and =-5 kV had dense and eqiaxed structure with (111) and (220) main peaks. X-ray diffraction patterns revealed some amount of in the films. The maximum microhardness of =35 GN/ was at the pulse bias of -5 kV. The P D technique was applied to enhance wear properties of commercial tools of HSS (SKH51) and WC-Co alloy (P30). The specimens were 25-kV PII nitrogen implanted to the dose 4.10 c and then coated with 4- TiN film on buffer layer. Wear resistance was compared by measuring weight loss under sliding test (6-mm counter ball, 500-gf applied load). After 30000 cycles at 500 rpm the untreated P30 specimen lost 3.10 g, and HSS specimens lost 9.10 g after 40000 cycles while quite zero losses were demonstrated by TiN coated specimens.s.