Magnesium sintered body oxide sputtering target for and a method of manufacturing the same

Purity excluding C is not less than 99.99 wt%, and 3.57 g / cm @ 3 has the above density, sputtering sintered magnesium oxide target, wherein the whiteness is 60% or less. To uniformly deposited magnesium oxide, higher purity, high density magnesium oxide target is requested. In the present invention, it is an object to provide a target and a manufacturing method thereof that can achieve this. Although raw material powder and hot pressing is to produce magnesium oxide sintered sputtering target, the central portion of the target, the color unevenness disadvantageously occurs to an extent approximately [phi] 60 (within a circle having a diameter of 60 mm) . Conventionally, especially was not paying attention to the above problem, the improvement in recent years of the deposition quality, it is necessary to investigate this problem, it was necessary to find a solution for it.