Comparison of rule-based versus model-based decomposition technique

Double patterning is one of the main enabling technologies for expanding lithography beyond 45nm technology node. Geometric pitch split and litho friendly design is the core of double patterning. There has been lot of development recently in area of DP to minimize split errors and hot spots. In this paper we demonstrate one such application of predictive modeling to detect hot spots. The matrix for pitch splitting is developed at higher resolution wavelengths in design stage and the decomposed results are evaluated with different source types. This type of predictive model confronts hot spot information and un-resolvable pitches in design stage and assists in developing restricted design rules for litho friendly design.