The preparation and investigation of all thin film electrochromic devices based on reactively sputtered MoO3 thin films

Abstract Reactively sputtered molybdenum trioxide (MoO3) thin films were systematically investigated and employed as cathodic electrochromic layers in all thin film electrochromic devices (ATF-ECDs). The gas loop controller was employed for adjustment of inputted oxygen gas flux by monitoring the target voltage during reactive sputtering. The working pressure played a great role on the deposition rate, crystallite size, optical properties and the electrochromic properties of MoO3 and the applied ATF-ECDs (soda lime glass (SLG)/ITO/NiOX/Ta2O5/MoO3/ITO). A 4 Pa MoO3 based ATF-ECD achieved a high optical modulation (transmission @ 600 nm) of ~50% and a high coloration efficiency of 149.4 cm2/C.