Study of growth kinetics of amorphous carbon nanopillars formed by PECVD

In this paper we study the process of plasma enhanced chemical vapor deposition (PECVD) of carbon nanostructures in the form of a film, the pillars, the flakes at a temperature of 100-350 °C from the vapor-gas mixture H2+CO+Ar. Also in the paper presents the structural features of the carbon nanopillars obtained at 250 °C. Determined mechanical stresses occurring during the growth of carbon nanostructures. Investigated the features of the growth of carbon pillars and proposed a phenomenological description of the process of their formation during PECVD process.