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Tall triple-gate device with TiN/HfO2 gate stack
Tall triple-gate device with TiN/HfO2 gate stack
2005
Nadine Collaert
Marc Demand
I. Ferain
J. G. Lisoni
R. Singanamalla
Paul Zimmerman
Y.S. Yim
Tom Schram
Geert Mannaert
M. Goodwin
Jacob Hooker
Francois Neuilly
Myeong-Cheol Kim
Christina De Meyer
Stefan De Gendt
Werner Boullart
Malgorzata Jurczak
S. Biesemans
Keywords:
Tin
Electronic engineering
Materials science
Optoelectronics
gate stack
triple gate
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