Influence of sputtering conditions on ionic conductivity of LiPON thin films

LiPON films were deposited using radio-frequency magnetron sputtering in a pure N2 gas atmosphere. The influence of rf power, N2 pressure, target–substrate distance and target density on thin film composition and ionic conductivity has been studied. Impedance measurements performed between 25 and 80 °C have indicated that ionic conductivity increases with nitrogen incorporation into the glass structure. An increase in the deposition rate with the target density has also been observed.