Ion sputtering rate of nanostructured FCC, BCC and HCP metals processed by severe plastic deformation

The effect of nanostructuring on the ion sputtering rate of metals and the glow discharge current is studied. Nanostructured samples were processed by severe plastic deformation using high pressure torsion. For comparative measurements, coarse-grained samples were obtained by annealing of nanostructured samples. The sputtering rates of nanostructured and coarse-grained nickel, iron and zirconium were measured after ion sputtering in glow gas-discharge. It has been found that nanostructuring of metals leads to an increase in the ion sputtering rate and the glow discharge current. Possible causes of changes in the ion sputtering rate due to nanostructuring are analyzed.