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Fluorocarbon radical behavior of synchronized dc-imposed pulsed plasmas for advanced dielectric etching processes
Fluorocarbon radical behavior of synchronized dc-imposed pulsed plasmas for advanced dielectric etching processes
2017
Toshinari Ueyama
Keigo Takeda
Hiroki Kondo
Kenji Ishikawa
Makoto Sekine
Masaru Hori
Manabu Iwata
Yoshinobu Ohya
Keywords:
Dielectric
Etching
Reactive-ion etching
Plasma
Plasma diagnostics
Analytical chemistry
Chemistry
Fluorocarbon
Optoelectronics
Correction
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