Installation and early operating experience with the Helios compact synchrotron x‐ray source

C. N. Archie,J. I. Granlund,R. W. Hill,Kenneth W. Kukkonen,Jeffrey A. Leavey,L. G. Lesoine,James M. Oberschmidt,A. E. Palumbo,Chet Wasik,M. Q. Barton,J. P. Silverman,John Michael Warlaumont,A. D. Wilson,R. J. Anderson,N. C. E. Crosland,A. R. Jorden,V. C. Kempson,J. Schouten,A. I. C. Smith,M. C. Townsend,J. Uythoven,M. C. Wilson,Martin N. Wilson,David E. Andrews,Romae Palmer,R. Webber,A.J. Weger

Installation and early operating experience with the Helios compact synchrotron x‐ray source

1992

During 1991 the Oxford Instruments’ compact synchrotron x‐ray source Helios was installed at IBM’s Advanced Lithography Facility, following factory tests in Oxford during 1990. The machine has met or exceeded all performance specifications at the East Fishkill site. Since January, 1992 it has been run routinely for lithography development work. Running and reliability statistics are being generated, and the results for the first five months are presented here.

Keywords:

X-ray lithography
Optics
HeliOS
Storage ring
Synchrotron
Lithography
X-ray
Chemistry
Reliability (statistics)
IBM

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