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Argonne inverted sputter source

1983 
The emittance of the inverted sputter source with immersion lenses was measured to be about 5..pi.. mm mrad MeV/sup 1/2/ at the 75% level over a wide range of beam intensities. The use of the source in experiments with radioactive sputter targets and hydrogen loaded targets is described. Self contamination of the source is discussed.
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