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Molecular dynamics simulation of hole etching in SiO 2 by energetic fluorocarbon ion injection
Molecular dynamics simulation of hole etching in SiO 2 by energetic fluorocarbon ion injection
2018
Charisse Cagomoc
Michiro Isobe
Kazuhiro Karahashi
Takuya Hirohashi
Junichi Hashimoto
Mitsuhiro Omura
Hisataka Hayashi
Satoshi Hamaguchi
Keywords:
ion injection
Etching (microfabrication)
Fluorocarbon
Materials science
Molecular dynamics
Chemical engineering
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