In situ measurements of optical film parameters and plasma monitoring during reactive sputtering for advanced in-line process control

Abstract In this work the spectroscopic ellipsometry and the reflectometry/transmission measurements together with an advanced plasma monitor were used for inline measurements. All systems were installed in an inline sputtering equipment which enables a continuous deposition process—the condition for a direct feedback to the deposition parameters. The metrology tools were connected by a framework software which used an XML over TCP/IP connection. The setup allowed to control the multilayer deposition using a deposition script and to use the metrology tools for measuring the thicknesses and to correct the deposition rates.