Heteroepitaxial TiN of Very Low Mosaic Spread on Al2O3

Epitaxial growth of a titanium nitride film on sapphire is achieved at room temperature by means of reactive sputtering. An exceptionally low full-width at half maximum (FWHM) from the X-ray rocking curve of 0.07° (252 arcsec) is measured for the film grown at 600°C with a thickness of 50 nm.