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Acemap > Paper > Effects of Mask Line-and-Space Ratio in Replicating near-$\bf 0.1\mbox{-}{\mbi{\mu }}m$ Patterns in X-Ray Lithography

Effects of Mask Line-and-Space Ratio in Replicating near-$\bf 0.1\mbox{-}{\mbi{\mu }}m$ Patterns in X-Ray Lithography

1995 
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