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Effects of Mask Line-and-Space Ratio in Replicating near-$\bf 0.1\mbox{-}{\mbi{\mu }}m$ Patterns in X-Ray Lithography
Effects of Mask Line-and-Space Ratio in Replicating near-$\bf 0.1\mbox{-}{\mbi{\mu }}m$ Patterns in X-Ray Lithography
1995
Yukiko Kikuchi
Hiroshi Nomura
Kenzo Kondo
Iwao Higashikawa
Yoshio Gomei
Keywords:
Analytical chemistry
X-ray lithography
Optics
Physics
Correction
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