Template development for sub15nm nanoimprint lithography

Nanoimprint lithography (NIL) is promising technology for next generation lithography for the fabrication of semiconductor devices. The advantages of NIL are simpler process, less design rule restriction, which lead to lower cost-of-ownership, compared with conventional optical lithography. NIL is one to one lithography and contact transfer technique using template. Therefore template quality variations impact on wafer performance directly. To introduce NIL technology to high volume manufacturing (HVM) of semiconductor devices, improvement of template quality is very important. In the situation of pattern size shrinking, it is necessary to improve CD uniformity and defectivity to achieve the target of HVM. So that high accuracy QA (Quality Assurance) tools are required to qualify CD uniformity and defectivity which are key metrics on high-end template development. In this paper, we show the current status of template development for sub15nm NIL. For the template fabrication, double patterning technologies were applied to extend pattern resolution limit. Template replication was also implemented by template replication system Canon FPA1100-NR2. Finally we will show QA examples for high accuracy template by using key metrics such as CD uniformity, defectivity and Cross-sectional profile.