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A Reliable Interconnection Technology Using Organic Low-K Dielectrics for 0.18 μm CMOS Circuit
A Reliable Interconnection Technology Using Organic Low-K Dielectrics for 0.18 μm CMOS Circuit
1999
Kazuhiko Tokunaga
Koichi Ikeda
Takaaki Miyamoto
Toshiaki Hasegawa
Masanaga Fukasawa
Hideyuki Kito
Shingo Kadomura
Keywords:
Dielectric
CMOS
Electronic engineering
Interconnection
Materials science
Optoelectronics
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