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The Characterization of the Residual Film Formed By Plasma Etching of Polysiloxane Spin‐on‐Glass on Aluminum
The Characterization of the Residual Film Formed By Plasma Etching of Polysiloxane Spin‐on‐Glass on Aluminum
1990
Y. Shacham‐Diamand
R. Brener
Keywords:
Chemistry
Inorganic chemistry
Thin film
Analytical chemistry
Chemical composition
Aluminium
Spin glass
Fluorocarbon
Residual
Plasma etching
Microelectronics
Correction
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