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Effects of sputter gas pressure on the formation of compressively strained SiGe thin film using sputter epitaxy method
Effects of sputter gas pressure on the formation of compressively strained SiGe thin film using sputter epitaxy method
2021
Kento Ikeno
Yosuke Aoyagi
Nobumitsu Hirose
Akifumi Kasamatsu
Toshiaki Matsui
Yoshiyuki Suda
Takahiro Tsukamoto
Keywords:
Epitaxy
Materials science
Thin film
gas pressure
Optoelectronics
Sputtering
Correction
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