Electrical properties of multilayered Al/Ni and Al/Mo films

Abstract The structural and electrical properties of multilayered metallic systems prepared by r.f. sputtering are reported. The multilayers consist of alternating layers of aluminium and molybdenum or nickel, with superlattice periodicities in the range of 1.5–9.0 nm. The resistivity and its temperature dependence were measured at temperatures between 170 and 320 K. The most striking feature is the change in sign of the temperature coefficient of resistivity as the thickness of the aluminium layer is varied. The experimental results are interpreted in terms of a grain boundary reflection model.