Diffuse X-Ray Reflectivity Study of Interface Roughness in Mo/Si Multilayers

Diffuse x-ray reflectivity intensities were measured to characterize interface morphologies of Mo/Si multilayers with and without interleaved carbon thin layers. Parameters related to the interface morphologies can be obtained by fitting the measured intensities within the distorted wave Born approximation in such a way that intermixing widths of graded interfaces, correlated interface roughness amplitudes and vertical correlation lengths are obtained. The interface parameters of Mo/Si and Mo/C/Si/C multilayers are compared for as-grown samples and annealed ones.