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Present Status and Future Trend of Characteristic Variations in Scaled CMOS
Present Status and Future Trend of Characteristic Variations in Scaled CMOS
2008
Hiramoto Toshiro
Takeuchi Kiyoshi
Tsunomura Takaaki
Nishida Akio
Kamohara Shiro
Keywords:
MOSFET
Random dopant fluctuation
Electrical engineering
Threshold voltage
CMOS
Materials science
Electronic engineering
Engineering physics
future trend
Correction
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