Transparent conductive film and a method of manufacturing the same, and a sputtering target used in the manufacture

The present invention can be formed by a sputtering method, particularly a DC sputtering method, DC pulse sputtering method, and an object thereof is to provide a suitable tin oxide target to form a transparent conductive film by AC sputtering and MF sputtering method. The present invention provides a sputtering target for use in forming a transparent conductive film by sputtering, the sputtering target comprises a tin oxide as a main component, comprising niobium, tungsten, tantalum, bismuth and molybdenum and at least one element selected from the a dopant group, relates to a sputtering target containing a copper element, as a dopant.