MOLECULAR SPUTTERING AND DAMAGE INDUCED BY keV IONS IN MULTILAYERED LANGMUIR-BLODGETT FILMS

The irradiation effects (sputtering and damage) induced by keV ion in LangmuirBlodgett f i lms of different thickness a r e studied for different incidence angles and fo r doses up t o 3 x 1013 ions.cm-2. The fi lms composed of different superposed monolayers allow to study, in SIMS, t h e evolution of t h e molecular ion intensity as a function of film depth. The volume excited by the primary ion is characterized a t small incidence angle by a small radial extension with respect t o i t s depth extension.