Anti-reflection Coating of Silicon Nitride Film for Solar Cell by RF Magnetron Sputtering

Silicon nitride films for an anti-reflection coating were deposited on silicon via RF magnetron sputtering using a Si3N4 target. The best result was obtained at the sputtering condition of 340W RF power, 5 mtorr Ar atmosphere, 100℃ substrate temperature. The films showed 7.9% reflectance minimum with 2.35 refractive index, 0.21 absorption coefficient at 66.6 ㎚ thickness. The surface morphology showed a smooth and dense film with good adhesion to silicon surface.