나노,산화물 전자재료 : 자기세정을 위한 스퍼터링 TiO2 박막의 산소 표면처리에 따른 특성

Titanium oxide (TiO2) thin films were fabricated by unbalanced magnetron (UBM) sputtering. The fabricated TiO2 films were treated by oxygen plasma under various RF powers. We investigated the characteristics of oxygen plasma treatment on the surface, structural, and physical properties of TiO2 films prepared at various plasma treatment RF powers. UBM sputtered TiO2 films exhibited higher contact angle value, smooth surface, and amorphous structure. However, the rms surface roughness TiO2 films were rough, and the contact angle value was decreased with the increase of the plasma treatment RF power Also, the hardness value of TiO2 film as physical properties was slightly increased with the increase of the plasma treatment RF power. In the results, the performance of TiO2 films for self cleaning critically depended on the with the plasma treatment RF power.