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Molecular Dynamics Simulation of SiO 2 Etching by Energetic Fluorocarbon Ions
Molecular Dynamics Simulation of SiO 2 Etching by Energetic Fluorocarbon Ions
2019
Charisse Cagomoc
Michiro Isobe
Satoshi Hamaguchi
Keywords:
Molecular dynamics
Fluorocarbon
Chemical engineering
Ion
Silicon dioxide
Etching
Materials science
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