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Topography Simulations for Reactive Ion Etching (RIE), Sputtering, and Chemical Vapor Deposition (CVD)
Topography Simulations for Reactive Ion Etching (RIE), Sputtering, and Chemical Vapor Deposition (CVD)
2008
Shigeyuki Takagi
Seiji Onoue
Osamu Yamazaki
Katsumi Iyanagi
Keywords:
Hybrid physical-chemical vapor deposition
Chemical vapor deposition
Reactive-ion etching
Dry etching
Analytical chemistry
Plasma processing
Sputtering
Combustion chemical vapor deposition
Chemistry
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