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Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process
Influence of Vacancy in Silicon Wafer of Various Types on Surface Microroughness in Wet Chemical Process
1992
Tadahiro Ohmi
Toshihito Tsuga
J Takano
Masahiko Kogure
K. Makihara
Takayuki Imaoka
Keywords:
Wafer
Optoelectronics
Vacancy defect
surface
Materials science
process
Correction
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