An apparatus for vacuum deposition of composite TiN−Cu coatings using coupled vacuum-arc and ion-plasma processes
2017
A plasma-chemical reactor with the coupling of gas-discharge processes has been developed. These processes combine arc evaporation of titanium in a nitrogen-containing plasma and ion-plasma sputtering of copper with the formation of copper vapor. Experiments were carried out on the deposition of superhard nanostructured TiN−Cu composite layers.
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