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Manufacturing Sub-45 nm Mold for Nanoimprint Lithography with Focused Ion Beam
Manufacturing Sub-45 nm Mold for Nanoimprint Lithography with Focused Ion Beam
2007
Max Chung
Bohr-Ran Huang
M.H. Weng
C. S. Fu
Y. Y. Chang
S. W. Lai
J.M. Chiou
Y. C. Chen
Y.-H. Tzeng
Keywords:
X-ray lithography
Stencil lithography
Nanotechnology
Nanoimprint lithography
Focused ion beam
Multiple patterning
Next-generation lithography
Materials science
Mold
Optoelectronics
Correction
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