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Evaluation of High and Low Activation Resists for EUV Lithography
Evaluation of High and Low Activation Resists for EUV Lithography
2006
James W. Thackeray
Roger A. Nassar
Kathleen Spear-Alfonso
Tom Wallow
Bruno M. LaFontaine
Keywords:
Photochemistry
X-ray lithography
Outgassing
Optoelectronics
Resist
Materials science
Optics
Extreme ultraviolet lithography
line edge roughness
Correction
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