Scanning coherent x-ray microscopy as a tool for XFEL nanobeam characterization

During the last years, scanning coherent x-ray microscopy, also called ptychography, has revolutionized nanobeamcharacterization at third generation x-ray sources. The method yields the complete information on the complex valued, nanofocused wave field with high spatial resolution. In an experiment carried out at the Matter in Extreme Conditions (MEC) instrument at the Linac Coherent Light Source (LCLS) we successfully applied the method to an attenuated nanofocused XFEL beam with a size of 180(h) × 150(v)nm 2 (FWHM) in horizontal (h) and vertical direction (v), respectively. It was created by a set of 20 beryllium compound refractive lenses (Be-CRLs). By using a fast detector (CSPAD) to record the diffraction patterns and a fast implementation of the phase retrieval code running on a graphics processing unit (GPU), the applicability of the method as a real-time XFEL nanobeam diagnostic is highlighted.