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Novel X-ray sensitive resists for the LiGA-technique
Novel X-ray sensitive resists for the LiGA-technique
1994
L. H. Hautling
P. Hoessel
G. Hoffmann
Thomas Dr Wuensch
E. Koch
J. Hormers
O. Wollersheim
Keywords:
Polymer
LIGA
Lithography
Nanotechnology
Materials science
Resist
X-ray
Etching
Correction
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