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Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition
Potential of High-density Convergent Plasma Sputtering Device for Magnetic Film Deposition
2019
Taisei Motomura
Tatsuo Tabaru
Keywords:
Analytical chemistry
Deposition (law)
Chemical engineering
Plasma
Materials science
Sputtering
high density
Optoelectronics
magnetic films
Correction
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