Comparative Studies on the Characteristics of ZnO Thin Films Deposited by Single-Step and Two-Step Method Using RF Sputtering

ZnO thin films are deposited by single step and a two-step method on Si (100) substrates by using RF sputtering. The comparisons are based on structural, surface morphology and topography of ZnO thin films. XRD pattern of the ZnO film derived by two-step method exhibited single crystalline wurtzite structure. AFM results revealed the crystallite size and roughness of the ZnO thin film.