Monomeric, polymeric compounds, the resist material, and a pattern forming method

PROBLEM TO BE SOLVED: To provide a monomer useful as a functional material and a raw material of medicine and agriculture and the like which provides a resist material where a negative pattern remained in a resist film can keep resistance in an etching step and a pattern shape after etching; a polymer compound containing a repeating unit derived from the monomer; a resist material containing the polymer compound; and a pattern formation method using the resist material.SOLUTION: There are provided a monomer having such a specific structure that its side chain has trifluoromethyl and a hydroxyl group in its terminal, has two ester bonds, an alkylene group, a methylene group or an ethylidene group, and a substituent group having polarity changed by an action of acid; a polymer compound containing the monomer; a resist material containing the polymer compound as a base resin; and a pattern formation method using the resist material.SELECTED DRAWING: None