Magnetic properties of Co-N thin films deposited by reactive sputtering

Abstract Co–N thin films with thickness of 80 nm were deposited using direct current magnetron sputtering at different N 2 partial pressures (PP). The composition, structure and magnetic properties were characterized using Rutherford Backscattering Spectrometry, X-ray Diffraction, Atomic Force Microscopy and Magnetometry. The magnetic properties vary with the nitrogen content of the film, determined by the N 2 PP used for deposition, and are correlated with the cobalt content of the film. The magnetic phases Co 4 +  x N and Co 3 N were identified as responsible for the variation of the magnetization values.