Defects in hard coatings studied by positron annihilation spectroscopy and x‐ray diffraction

James P. Schaffer,Anthony J. Perry,Jean Brunner

Defects in hard coatings studied by positron annihilation spectroscopy and x‐ray diffraction

1992

James P. Schaffer
Anthony J. Perry
Jean Brunner

TiNx (0.5positron annihilation spectroscopy and x‐ray diffraction techniques. The deposition parameters investigated include nitrogen partial pressure, deposition power, substrate bias, film thickness, and substrate condition. The synergistic effects of using multiple techniques to characterize the same or similar samples is emphasized.

Keywords:

Thin film
Sputtering
Analytical chemistry
X-ray crystallography
Positron annihilation spectroscopy
Diffraction
Chemistry
Substrate (chemistry)
Deposition (law)
Partial pressure

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