Influence of N content on structure and mechanical properties of multi-component Al-Cr-Nb-Y-Zr based thin films by reactive magnetron sputtering

Abstract Al-Cr-Nb-Y-Zr-N films have been deposited with reactive dc magnetron sputtering at various N2 flow ratios to achieve films with different nitrogen content, from purely metallic to fully nitrided films. The structure evolved from mainly amorphous with a minor crystalline intermetallic phase for the film without nitrogen, to nanocomposites with a cubic crystalline phase in an amorphous matrix for intermediate nitrogen content (15–41 at.% N), and at higher nitrogen content (46–51 at.% N) to crystalline solid solution nitrides with a NaCl-type structure. Partial elemental segregation on the nanoscale was found in all studied samples and the films exhibited different segregation behaviour depending on the nitrogen content, implying that the structural evolution on the nanoscale of films in this material system complex and highly composition-dependent. The hardness increased with increasing nitrogen content, reaching a maximum at about 30 GPa at for the nitride films with 50 at.% N. Deformation behaviour, studied by indentation measurements, of the nitride films was found to be ductile, where no sign of crack formation could be observed. This can be attributed to a metallic phase in the columnar boundaries caused by partial elemental segregation of mainly yttrium. Hence, films within in this material system, although the nanostructure is found to be relatively complex, show very promising mechanical properties and the structural complexity can be used as a guide for designing nitride materials that combine high hardness with ductility.