State-of-arts of vacuum fabrication technology of CIGS thin film and its sputtering target

Two vacuum preparing principles and procedures of CIGS thin film are illustrated in this paper.Relative merits of the two methods are investigated and analyzed.The molten casting method and powder metallurgy method for quaternary target manufacture are described.As required in the target preparation,the parameters,such as temperature,pressure and hold time,are elaborated.The annealed thin films which are sputtered from quaternary targets by employing uniform and fine powders,following with pressing and sintering,are supposed to have greater application prospects.